| AVS 57th International Symposium & Exhibition | |
| Plasma Science and Technology | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS2-TuA1 Plasma Study in Modulated Pulse Power (MPP) Magnetron Sputtering with Different Magnetron Configurations D.N. Ruzic, L. Meng, S. Jung, M.J. Neumann, University of Illinois at Urbana-Champaign |
| 2:20pm | PS2-TuA2 Spatial Evolution of Plasma Generated VUV in a Microwave Surface-Wave Plasma J.P. Zhao, L. Chen, M. Funk, R. Bravenec, R. Sundararajan, Tokyo Electron America Inc., K. Koyama, T. Nozawa, Tokyo Electron Limited, Japan, S. Samukawa, Tohoku University, Japan |
| 2:40pm | PS2-TuA3 Invited Paper PM Helicons: A Better Mousetrap F.F. Chen, UCLA |
| 4:00pm | PS2-TuA7 Modeling of a Transformer-type Toroidal Plasma Source S. Rauf, Z. Chen, K. Collins, Applied Materials Inc. |
| 4:20pm | PS2-TuA8 Self-Consistent Electrodynamics of Large-Area High-Frequency Capacitive Plasma Discharge Z. Chen, S. Rauf, K. Collins, Applied Materials Inc. |
| 4:40pm | PS2-TuA9 Invited Paper Independent Control of Ion Energy and Flux in CCPs by the Electrical Asymmetry Effect U. Czarnetzki, Ruhr-University Bochum, Germany |
| 5:20pm | PS2-TuA11 Inhomogeneous Magnetic Field Interaction with VHF and HF Capacitively Coupled Plasmas K. Bera, S. Rauf, K. Collins, Applied Materials, Inc. |
| 5:40pm | PS2-TuA12 Properties of Corona Bar Discharges for Production of Preionizing UV Light Z. Xiong, M.J. Kushner, University of Michigan, Ann Arbor |