AVS 57th International Symposium & Exhibition
    Vacuum Technology Monday Sessions
       Session VT+MN-MoM

Paper VT+MN-MoM5
Nitrogen Incorporated Ultrananocrystalline Diamond as a Robust Cold Cathode Material for Miniature Mass Spectrometry Application in Space Exploration

Monday, October 18, 2010, 9:40 am, Room Laguna

Session: MEMS Sensors, Vacuum Gauges, Measurements and Pumps
Presenter: X. Wang, University of Puerto Rico; Argonne National Laboratory
Authors: X. Wang, University of Puerto Rico; Argonne National Laboratory
S. Getty, NASA Goddard Space Flight Center
A.V. Sumant, Argonne National Laboratory
O.H. Auciello, Argonne National Laboratory
D. Glavin, NASA Goddard Space Flight Center
P. Mahaffy, NASA Goddard Space Flight Center
Correspondent: Click to Email

Ultrananocrystalline diamond (UNCD) thin films have been investigated for over a decade for application to electron field emission devices since they offer very low threshold voltage (1-3 V/µm) and reasonably stable field emission with time. Due to the small grain size (2-5 nm) and unique atomically abrupt grain boundary structure containing mixed sp2/sp3 carbon bonding, it has been postulated that field emission occurs mainly at the grain boundary due to the high field enhancement effect at the grain boundary and stable field emission has been observed independent of surface geometry or film thickness. In addition to low power consumption and potential for miniaturization, robust field emission materials are compelling for applications as long life electron sources for mass spectrometers for space exploration where electron sources are exposed to harsh environments. A miniaturized mass spectrometer under development for in situ chemical analysis on the moon and other planetary surfaces requires a robust, long-lived electron source, to generate ions from gaseous sample using electron impact ionization. To this end, we have explored the field emission properties and lifetime testing of nitrogen-incorporated ultrananocrystalline diamond (N-UNCD). The N-UNCD films were synthesized in a microwave plasma chemical vapor deposition system by introducing nitrogen in the Ar/CH4 gas chemistry. Characterization of the N-UNCD films were carried out by using visible and UV Raman spectroscopy confirming characteristic signature of a good quality N-UNCD film. We will present results revealing that UNCD films with nitrogen incorporation during growth yield stable/high field-induced electron emission in high vacuum for up to 1000 hours.

This work was done with support from the NASA Astrobiology Science and Technology Instrument Development Program, under Grant Number 07-ASTID07-0020, and the NASA Goddard Space Flight Center Internal Research and Development Program. Use of the Center for Nanoscale Materials was supported by the U. S. Department of Energy, Office of Science, Office of Basic Energy Sciences, under Contract No. DE-AC02-06CH11357.