| AVS 57th International Symposium & Exhibition | |
| Thin Film | Monday Sessions |
| Session TF+EN-MoM |
| Session: | ALD: Energy Applications |
| Presenter: | P.C. Stair, Northwestern University & Argonne National Lab |
| Authors: | P.C. Stair, Northwestern University & Argonne National Lab J. Lu, Northwestern University H. Feng, Argonne National Laboratory J.E. Libera, Argonne National Laboratory J.W. Elam, Argonne National Laboratory M.J. Pellin, Argonne National Laboratory H.-S. Kim, Northwestern University |
| Correspondent: | Click to Email |
Atomic Layer Deposition (ALD) has enormous potential for the synthesis of advanced heterogeneous catalysts with controlled composition and structure at the atomic scale. The ability of ALD to produce conformal oxide coatings on porous, high-surface area materials offers the possibility to provide completely new types of catalyst supports. At the same time ALD can achieve highly uniform catalytically active metal and oxide phases with (sub-) nanometer dimensions.
Vanadium oxide species supported on high surface area oxides are among the most important catalytic materials for the selective, oxidative conversion of hydrocarbons to useful chemicals. In our laboratory ALD has been used to synthesize both the catalytic vanadium oxide and the supporting oxide on both high surface powders and anodic aluminum oxide (AAO) nanoliths. These materials have been characterized by SEM, XRF, ICP, UV-Vis absorption spectroscopy, Raman spectroscopy and evaluated for the oxidative dehydrogenation (ODH) of cyclohexane.
More recently we have studied what we call “ABC-type” ALD in which metal nanoparticles and support materials are grown sequentially in each ALD cycle. This method makes possible metal deposition at lower temperatures than conventional AB-type ALD and exceptionally small particles, ca. 0.5 nm. Using additional ALD support layers at the conclusion of the growth, the metal particles are stabilized against sintering at high temperatures and reaction conditions.