| AVS 57th International Symposium & Exhibition | |
| Plasma Science and Technology | Monday Sessions |
| Session PS2-MoA |
| Session: | Atmospheric Plasma Processing and Micro Plasmas |
| Presenter: | S.A. Starostin, Eindhoven University of Technology, Netherlands |
| Authors: | S.A. Starostin, Eindhoven University of Technology, Netherlands P. Antony Premkumar, Materials Innovation Institute (m2i), Netherlands M. Creatore, Eindhoven University of Technology, Netherlands H. de Vries, FUJIFILM Manufacturing Europe BV, Netherlands M.C.M. van de Sanden, Eindhoven University of Technology, Netherlands |
| Correspondent: | Click to Email |
The dielectric barrier discharge (DBD) is recognized as a promising tool of thin films deposition on various substrates at atmospheric pressure. Emerging applications including encapsulation of flexible solar cells and flexible displays require large scale low costs production of transparent uniform dense layers with low level of surface defects. Unfortunately the common operational mode of the atmospheric pressure DBD is filamentary, resulting in strong spatial non-uniformity of plasma chemistry and affecting the quality of the deposited films. Sustaining of the filament-free non-thermal plasma over the large area substrate at atmospheric pressure remains a challenging task especially considering the discharge in ambient air [1].
In present contribution the diffuse dielectric barrier discharge in atmospheric pressure air was applied for the thin film deposition on polymeric web in industrially relevant roll-to-roll configuration. The silica-like film deposition was performed using the admixture of hexamethyldisiloxane precursor to air flow. Discharge diagnostics was realized by means of fast ICCD imaging; time resolved optical emission spectroscopy and electrical characteristics analysis. ICCD discharge imaging confirms plasma uniformity in a microsecond time scale, while at nanosecond time scale shows fast propagating lateral ionization waves. Morphology and composition analyses, performed by means of AFM, ATR-FTIR and XPS methods, indicate that the process results in ultra-smooth films (roughness comparable to initial substrate roughness) and shows the possibility to synthesize carbon-free layers.