AVS 57th International Symposium & Exhibition
    Spectroscopic Ellipsometry Focus Topic Thursday Sessions
       Session EL+AS+EM+MS+TF-ThP

Paper EL+AS+EM+MS+TF-ThP5
In-Situ Spectroscopic Ellipsometry of Lithium Ion Intercalation in GLAD Three-Dimensional Nanostructured Thin Films

Thursday, October 21, 2010, 6:00 pm, Room Southwest Exhibit Hall

Session: Spectroscopic Ellipsometry Focus Topic Poster Session
Presenter: E. Montgomery, University of Nebraska - Lincoln
Authors: E. Montgomery, University of Nebraska - Lincoln
M. Schubert, University of Nebraska - Lincoln
E.B. Schubert, University of Nebraska - Lincoln
T. Hofmann, University of Nebraska - Lincoln
D. Schmidt, University of Nebraska - Lincoln
R.A. May, University of Texas at Austin
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Lithium intercalation in thin nanostructured and bulk films from metals and semiconductors has been studied using in-situ spectroscopic ellipsometry. Nanostructured thin films have a large surface area, and the stress caused by the intercalation of lithium is reduced in comparison to continuous films. The films are deposited using electron beam evaporation at a glancing angle or Glancing Angle Deposition (GLAD).

The charge capacity of the films can be observed as a change of index of refraction using ellipsometry. We will study intercalation as a function of structure geometry in chiral and achiral 3D GLAD thin films deposited from different metals onto silicon and other dielectric substrates. We report the anisotropic dielectric functions of the 3D nanostructures and their changes as a function of intercalation time and period.