AVS 57th International Symposium & Exhibition
    Spectroscopic Ellipsometry Focus Topic Friday Sessions
       Session EL+AS+EM+MS+TF-FrM

Paper EL+AS+EM+MS+TF-FrM7
Spectroscopic Ellipsometry on Graphene

Friday, October 22, 2010, 10:20 am, Room Cochiti

Session: Spectroscopic Ellipsometry - Inorganic Thin Films
Presenter: J.W. Weber, Eindhoven University of Technology, Netherlands
Authors: J.W. Weber, Eindhoven University of Technology, Netherlands
V.E. Calado, Delft University of Technology, Netherlands
M.C.M. van de Sanden, Eindhoven University of Technology, Netherlands
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We show how we used spectroscopic ellipsometry to determine both the optical constants and thickness of graphene1. We scanned a mechanically exfoliated graphene flake (150 x 380 μm) on an oxidized silicon wafer (98 nm SiO2) with a spectroscopic ellipsometer with a focused spot (100 x 55 μm) at an angle of 55°, in the range 210-1000 nm. The spectroscopic ellipsometric data were analyzed with an optical model in which the optical constants of graphene were parameterized by B-splines.2,3 This parameterization was key in the uncorrelated, accurate and simultaneous determination of the optical constants and thickness of graphene. The thickness is in perfect agreement with the thickness as expected from the interlayer spacing in graphite: 3.4 Å. This work opens up the possibility for in situ monitoring of graphene growth.
 
References
[1] K. S. Novoselov, A. K. Geim, S. V. Morozov, D. Jiang, Y. Zhang, S. V. Dubonos, I. V. Grigorieva, and A. A. Firsov,  Science 306, 666 (2004).
[2] B. Johs and J. S. Hale, Phys. Status Solidi A 205, 715 (2008).
[3] J. W. Weber, T. A. R. Hansen, M. C. M. van de Sanden, and R. Engeln,  J. Appl. Phys. 106, 123503 (2009).