| AVS 56th International Symposium & Exhibition | |
| Thin Film | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF-WeA1 ALD Applications to DNA Sequencing, Electrolytic Junctions and Nanofluidics S.M. Rossnagel, S.-W. Nam, IBM T.J. Watson Research Center |
| 2:20pm | TF-WeA2 Fabrication and Characterization of Point Contact Metal-Insulator-Metal Diodes for Potential Applications in Energy Harvesting P. Periasamy, Colorado School of Mines, A. Dameron, J. Bergeson, J. Berry, P. Parilla, D.S. Ginley, National Renewable Energy Laboratory, R. O'Hayre, Colorado School of Mines |
| 2:40pm | TF-WeA3 Tungsten Oxide (WO3) Thin Films for Application in Advanced Energy Systems S.K. Gullapalli, C.V. Ramana, University of Texas at El Paso |
| 3:00pm | TF-WeA4 Growth Kinetics in a Large-Bore Vertically-Aligned Carbon Nanotube Film CVD Process K. Bosnick, L. Dai, National Research Council Canada |
| 4:00pm | TF-WeA7 Study of Silicon Strain in Shallow Trench Isolation M. Belyansky, N. Klymko, D. Chidambarrao, R. Conti, F. Liu, IBM |
| 4:20pm | TF-WeA8 Critical Compressive Stress for Cracking of Al2O3 ALD Films S.H. Jen, J.A. Bertrand, S.M. George, University of Colorado |
| 4:40pm | TF-WeA9 Elaboration of Dichroic Filters on Shape Memory Substrate O. Carton, M. Lejeune, A. Zeinert, Laboratoire de Physique de la Matière Condensée, France, S. Zaidi, F. Lamarque, Laboratoire Roberval, France |
| 5:00pm | TF-WeA10 Single-Stage Deposition of Organic/Inorganic Multilayer by Plasma Enhanced and Initiated Chemical Vapor Deposition A.M. Coclite, University of Bari, Italy, G. Ozaydin-Ince, Massachusetts Institute of Technology, F. Palumbo, R. d'Agostino, University of Bari, Italy, K. Gleason, Massachusetts Institute of Technology |
| 5:20pm | TF-WeA11 The Role of Ammonia as an Inhibitor Species in Low Temperature CVD to Reduce Film Growth Rate and Enhance Conformal Coverage S. Babar, P. Zhang, W. Wang, N. Kumar, J.R. Abelson, University of Illinois, Urbana-Champaign |
| 5:40pm | TF-WeA12 Nanoscale Engineering of Ceramic Supports for High Permeance Ultrafiltration Membranes R. Nahm, P.C. Rowlette, C.A. Wolden, Colorado School of Mines |