| AVS 56th International Symposium & Exhibition | |
| Plasma Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | PS1-WeM1 A New Diagnostic Tool of Electron Energy Distribution Function in Capacitive Mode Plasmas in a Variety of Frequencies H. Shindo, Y. Nakazaki, Tokai University, Japan |
| 8:20am | PS1-WeM2 A Diagnostic Investigation of Pulsed PECVD for Thin Film Deposition C. Lange, C.A. Wolden, Colorado School of Mines |
| 8:40am | PS1-WeM3 Characterization and Active Stabilization of Plasma and Generator Interactions V.L. Brouk, D. Carter, Advanced Energy Industries, Inc., J. Roberg, Advanced Energy Industries, Inc |
| 9:00am | PS1-WeM4 Plasma Characterization of a 200-mm Hollow Cathode Magnetron for the Deposition of Metallic and Compound Thin Films L. Meng, R.E. Flauta, M.J. Neumann, D.N. Ruzic, University of Illinois at Urbana-Champaign |
| 9:20am | PS1-WeM5 Invited Paper Probe Measurements in a Very High Frequency CCP Discharge L. Dorf, S. Rauf, K. Ramaswamy, K. Collins, Applied Materials |
| 10:40am | PS1-WeM9 Macroscopic Diagnostics for In-Situ Measurement of Sidewall Charging During Plasma Etching E. Ritz, J.A. Hoban, M.J. Neumann, D.N. Ruzic, University of Illinois at Urbana-Champaign |
| 11:00am | PS1-WeM10 Study on Relation between CFx Radicals and Plasma Parameters in ICP Plasmas with Laser-Induced Fluorescence and Wave Cutoff Probe J.-H. Kim, Korea Research Institute of Standards and Science (KRISS), K. Rho, KAIST, South Korea, Y.-S. Yoo, S.-J. You, D.-J. Seong, Y.-H. Shin, KRISS, South Korea |
| 11:20am | PS1-WeM11 Development of High Density Radical Source and the Behaviors of Radicals in N2-H2 Mixture Plasma S. Chen, Nagoya University, Japan |