AVS 56th International Symposium & Exhibition
    Manufacturing Science and Technology Thursday Sessions

Session MS+GR+MI-ThM
Manufacturing Issues for Beyond CMOS Nanoelectronics

Thursday, November 12, 2009, 8:00 am, Room C3
Moderator: R.E. Geer, University at Albany


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:40am MS+GR+MI-ThM3 Invited Paper
Spin-Polarized Electrons in Silicon
B. Huang, I. Appelbaum, University of Maryland
9:20am MS+GR+MI-ThM5 Invited Paper
Methods for Characterizing Variations in Excitation Mode Frequency and Linewidth in Spin Transfer Nanocontact Oscillators
M.R. Pufall, W.H. Rippard, National Institute of Standards and Technology
10:40am MS+GR+MI-ThM9 Invited Paper
Large Area, Continuous Single- and Few- Layer Graphene Films on Insulating Substrates
J. Kong, Massachusetts Institute of Technology
11:20am MS+GR+MI-ThM11 Invited Paper
Graphene Nanoelectronics for Post-CMOS Logic Switches
C.Y. Sung, IBM T.J. Watson Research Center