AVS 56th International Symposium & Exhibition | |
Advanced Surface Engineering | Tuesday Sessions |
Session SE+TF-TuA |
Session: | Glancing Angle Deposition II |
Presenter: | S. Mukherjee, Rensselaer Polytechnic Institute |
Authors: | S. Mukherjee, Rensselaer Polytechnic Institute D. Gall, Rensselaer Polytechnic Institute |
Correspondent: | Click to Email |
Ta, Nb, Cr and Al nanorod structures were grown by glancing angle physical vapor deposition on a continuously rotated Si(001) substrate at an incidence angle of 84° and at substrate temperatures Ts = 300-1125 K. The width w of the self-affine nanorods increases with the height h according to wαhp. The growth exponent p is a function of the homologous substrate temperature θ, which is the ratio of Ts to the melting point Tm. All studied metallic systems exhibit the same p(θ) curve: p approaches a value of 0.5 for negligible surface diffusion (θ < 0.1) and monotonously decreases to p = 0.39 for θ = 0.2, as predicted by Meakin and Krug’s model of nanorod growth with limited surface diffusion and by Mullins-Herring’s model of 2+1 dimensional interface growth, respectively. However, p increases dramatically for θ = 0.22-0.26, to reach an anomalous value of 0.71. Above the transition temperature θc = 0.24±0.02, the growth exponent decreases to reach p = 0.3 at θ = 0.42.