| AVS 56th International Symposium & Exhibition | |
| Plasma Science and Technology | Tuesday Sessions |
| Session PS2-TuM |
| Session: | Atmospheric Plasma Processing and Microplasmas |
| Presenter: | R. Dussart, Universite d'Orleans - CNRS, France |
| Authors: | R. Dussart, Universite d'Orleans - CNRS, France T. Dufour, Universite d'Orleans, France L.J. Overzet, University of Texas, Dallas M. Mandra, University of Texas, Dallas J.B. Lee, University of Texas, Dallas M. Goeckner, University of Texas, Dallas L.C. Pitchford, CNRS - Laplace, France N. Sadeghi, LSP - CNRS, France P. Lefaucheux, CNRS, France P. Ranson, Universite d'Orleans, France |
| Correspondent: | Click to Email |
Micro Hollow Cathode Discharges (MHCDs) offer the unique property to create DC micro plasmas in a stable regime at atmospheric pressure [1]. In collaboration with UTDallas ( Texas ), micro reactors are elaborated by usual microtechnology techniques (sputtering, electrodeposition, lithography, …), usually used in microelectronics and MEMS technology. A first set of microcavities in alumina were prepared and tested in helium. Optical and electrical characterizations were carried out in different cases: single or several cavity devices and for a limited or not cathode area. V- I characteristics were plotted in the different configurations and for different experimental conditions. When the cathode area is limited, an abnormal glow regime can be obtained, which favors the initiation of the plasma in multiple cavities [2]. By adding a small amount of N2 to the discharge, the gas temperature was determined by fitting the second positive system C3Õu-B3Õg emission spectra using the software developed at the LSP at Grenoble ( France ). Simulations of a single MHCD with variable cathode surface area were also carried out using the 2D code developed in Toulouse [3]. Simulation results will be compared to the experimental data. Finally, by applying voltage ramps to the microdischarge, hysteresis effects were observed and will be also discussed.
[1] K. H. Schoenbach, R. Verhappen, T. Tessnow, P. F. Peterkin, W. Byszewski, « Microhollow cathode discharges » Appl. Phys. Lett. 68, 13 (1996)
[2] T. Dufour, R. Dussart, P. Lefaucheux, P. Ranson, L. J. Overzet, M. Mandra, J. B. Lee, M. Goeckner « Effect of limiting the cathode surface on direct current microhollow cathode discharge in helium » Appl. Phys. Lett., 93, 071508 (2008)
[3] J. P. Boeuf and L. C. Pitchford, K. H. Schoenbach, « Predicted properties of microhollow cathode discharges in xenon » Appl. Phys. Lett., 86, 071501 (2005)