AVS 56th International Symposium & Exhibition
    Plasma Science and Technology Wednesday Sessions
       Session PS2+TF-WeM

Paper PS2+TF-WeM2
Self-limiting Deposition of Nanolaminates by Pulsed PECVD

Wednesday, November 11, 2009, 8:20 am, Room B2

Session: Plasma Deposition and Plasma-assisted ALD
Presenter: C.A. Wolden, Colorado School of Mines
Authors: P.C. Rowlette, Colorado School of Mines
C.A. Wolden, Colorado School of Mines
Correspondent: Click to Email
Self-limiting synthesis of alumina-titania nanolaminates (ATO, Al2O3/TiO2) was accomplished via pulsed plasma-enhanced chemical vapor deposition. At the synthesis temperature of 150 °C the alumina layers were amorphous, while TiO2 layers displayed a polycrystalline anatase structure. Digital control over nanolaminate structure was demonstrated through elemental analysis and TEM imaging. The optoelectronic properties of the ATO structures were examined as a function of composition and bilayer thickness. C-V measurements showed that the effective dielectric constant (κ) of the nanolaminates was consistent with treating the structure as individual capacitors in series. I-V measurements showed that leakage current deteriorated with TiO2 content, though low leakage was restored through interfacial engineering. With respect to dielectrics these results suggest that the best nanolaminate would employ Al2O3 interface layers deposited by PE-ALD to minimize leakage current, and that these two layers would sandwich a single TiO2 layers whose thickness would set the effective dielectric constant. We will also present work in SiO2 –TiO2 nanolaminates formed by the same technique at room temperature with applications as optical components. Finally, we will present recent findings in the area of inorganic/organic hybrid nanolaminates formed by alternating oxide and polymer layers.