| AVS 56th International Symposium & Exhibition | |
| Plasma Science and Technology | Monday Sessions |
| Session PS2+PV-MoM |
| Session: | Plasma Processing for Photovoltaics |
| Presenter: | D. O'Farrell, Dublin City University, Ireland |
| Authors: | D. O'Farrell, Dublin City University, Ireland A.R. Ellingboe, Dublin City University, Ireland S. Linnane, Dublin City University, Ireland C. Gaman, Dublin City University, Ireland |
| Correspondent: | Click to Email |
The ability to deposit large area thin film amorphous silicon films using PECVD is of significant interest in a number of fields including photovoltaics and flat panel display. The desire to deposit larger area films faster has lead to a recent push towards the use of VHF/UHF frequencies which result in faster deposition rates but also result in significant film non-uniformities due to wavelength effects even over relatively small areas. Several methods have been employed in an attempt to overcome these non-uniformity issues but many barriers still exist when it comes to wide scale application. In this work a scalable, multi-electrode, VHF/UHF plasma source is described which aims to resolve these issues. Data is presented demonstrating plasma uniformity over the source for a series of powers, pressures and operating frequencies. Different operating regimes are discussed.