AVS 56th International Symposium & Exhibition | |
Electronic Materials and Processing | Tuesday Sessions |
Session EM2-TuM |
Session: | Complex and Multifunctional Oxides |
Presenter: | E. Cagin, University of Michigan, Ann Arbor |
Authors: | E. Cagin, University of Michigan, Ann Arbor J.D. Phillips, University of Michigan, Ann Arbor |
Correspondent: | Click to Email |
Ferroelectric/semiconductor heterostructures are desirable for multifunctional devices using the charge of a ferroelectric material to manipulate the conductivity of a semiconductor. The quality of the ferroelectric/semiconductor interface is critical for maintaining a significant ferroelectric polarization charge density, and coupling this charge density into the semiconductor. Therefore, materials must have excellent chemical and structural compatibility. ZnO and LiNbO3 may provide the desired characteristics based on the crystalline compatibility of the materials, excellent semiconducting properties of ZnO, and excellent ferroelectric properties of LiNbO3. In this work, the structural and electrical characteristics of ZnO thin films deposited on z-cut LiNbO3 substrates by pulsed laser deposition will be presented and compared to ZnO thin films on c-plane sapphire substrates. In all experiments, preferentially-oriented c-plane ZnO thin films were obtained based on x-ray diffraction measurements.
Hall effect measurements demonstrate a background carrier concentration in ZnO of n=2. 6x1017cm-3 for ZnO/LiNbO3, and an order of magnitude decrease of n=3.0x1018cm-3 for ZnO/sapphire. Similarly, an improved electron mobility of μ=36 cm2/Vs is observed for ZnO/LiNbO3 in comparison to μ=21 cm2/Vs for ZnO/sapphire. The reduced carrier concentration and improved mobility are attributed to a depletion layer at the ZnO/LiNbO3 interface induced by polarization charge. The temperature dependence of electron transport in ZnO thin films will also be presented to examine the influence of polarization charge induced by the pyroelectric effect in LiNbO3.