AVS 56th International Symposium & Exhibition
    Applied Surface Science Thursday Sessions
       Session AS-ThA

Paper AS-ThA10
Metrics for Polymer Depth Profiling with C60 Ion Sources

Thursday, November 12, 2009, 5:00 pm, Room C2

Session: Chemical State Depth Profiling
Presenter: J.S. Hammond, Physical Electronics
Authors: J.S. Hammond, Physical Electronics
S.S. Alnabulsi, Physical Electronics
S.N. Raman, Physical Electronics
J.F. Moulder, Physical Electronics
Correspondent: Click to Email
C60 ion sources on XPS systems have recently been shown to provide a powerful capability for organic contamination removal and for depth profiling many organic and polymer materials. However the depth of uniform sputter yield has been found to depend on the impact energy of the C60 ion and the composition of the sample. To quantify the relative importance of other parameters that can extend the depth profiling range and uniformity of sputter yield during polymer depth profiling, Zalar azimuthal rotation during C60 sputtering, the angle of incidence of the C60 ion beam, sample temperature and integrated X-ray exposure has been explored. AFM imaging of the crater bottom at various depths of a sputter profiled sample has been used to characterize the sputtering process. Results will be presented for various materials using these different analysis conditions to improve the uniformity of sputter rates and interface definition of multi-layer polymer films.