| AVS 53rd International Symposium | |
| Thin Film | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | TF+EM-FrM1 Parameter Uncertainties and Higher-Order Effects in the Analytic First-Order Solution for the Complex Refractive Index and Thickness of a Thin Film on a Substrate I.K. Kim, D.E. Aspnes, North Carolina State University |
| 8:20am | TF+EM-FrM2 Optical and Morphological Studies on SiO@sub 2@-like Films Deposited by Means of Ion Bombardment- Assisted Expanding Thermal Plasma CVD A. Milella, M. Creatore, M.A. Blauw, M.C.M. Van De Sanden, Eindhoven University of Technology, The Netherlands |
| 8:40am | TF+EM-FrM3 Invited Paper Real-Time X-ray Studies of Surface and Thin-Film Processes K. Ludwig, Y. Wang, A. Özcan, G. Ozaydin, C. Sanborn, A. Bhattacharyya, R. Chandrasekaran, T.D. Moustakas, Boston University, R. Headrick, H. Zhou, University of Vermont |
| 9:20am | TF+EM-FrM5 Novel Annealing Treatments Applied to Binary Alloy Thin Films J.R. Skuza, R.A. Lukaszew, The University of Toledo, E.M. Dufresne, Argonne National Lab, C. Cionca, R. Clarke, University of Michigan, Ann Arbor, A. Cebollada, Instituto de Microelectronica de Madrid, Spain |
| 9:40am | TF+EM-FrM6 Invited Paper In-Situ Studies of Stress Evolution during the Heteroepitaxial Growth of Group III-Nitrides J.M. Redwing, S. Raghavan, X. Weng, J.D. Acord, E.C. Dickey, Penn State University |
| 10:20am | TF+EM-FrM8 In Situ ATR - FTIR Spectroscopy of Hf (IV) Tert Butoxide and Tetrakis Ethyl Methyl Amino Hf Adsorption on Si (100), Si (111) and Ge K. Li, S. Dubey, T.M. Klein, The University of Alabama |
| 10:40am | TF+EM-FrM9 In Situ Defect Spectroscopy: Probing Dangling Bonds during a-Si:H Film Growth by Subgap Absorption I.M.P. Aarts, A.C.R. Pipino, M.C.M. Van De Sanden, W.M.M. Kessels, Eindhoven University of Technology, The Netherlands |
| 11:00am | TF+EM-FrM10 In Situ Monitoring of Hafnium Oxide Atomic Layer Deposition J.E. Maslar, W.S. Hurst, D.R. Burgess, W.A. Kimes, N.V. Nguyen, NIST |
| 11:20am | TF+EM-FrM11 In-situ and Real-Time Spectroscopic Ellipsometry on Organic Semiconductors during Growth U. Heinemeyer, Universit@um a@t T@um u@bingen, Germany, S.M. Kowarik, Oxford University, UK, A. Gerlach, F. Schreiber, Universit@um a@t T@um u@bingen, Germany, G. Humphreys, R. Jacobs, Oxford University, UK |