AVS 53rd International Symposium
    Applied Surface Science Wednesday Sessions
       Session AS-WeM

Paper AS-WeM3
TOF-SIMS Analysis of C60 Sputtered Organic Thin Films

Wednesday, November 15, 2006, 8:40 am, Room 2005

Session: Molecular Ion Sources and Characterization of Biomaterials
Presenter: S.R. Bryan, Physical Electronics
Authors: S.R. Bryan, Physical Electronics
J. Moulder, Physical Electronics
G.L. Fisher, Physical Electronics
N. Sanada, ULVAC-PHI
Correspondent: Click to Email
Sputtering of organic materials using a C60 ion beam has been demonstrated to produce significantly less accumulated damage compared to sputtering with atomic ion beams. This has opened up the possibility of sputtering organic materials while maintaining the organic structural integrity at the bottom of the crater. We have studied C60 sputtering for several years using XPS. This has lead to a better understanding of the optimum sputting conditions. In this presentation we will present new data on TOF-SIMS analysis of C60 sputtered organic films. By combining the quantification and atomic bonding information from XPS with the longer range structural information from TOF-SIMS, a better understanding of the C60 sputtering process will emerge.