AVS 53rd International Symposium
    Applied Surface Science Wednesday Sessions
       Session AS-WeM

Invited Paper AS-WeM1
Recent Advancements in Polymeric Depth Profiling with an SF@sub 5@@super +@ Cluster Primary Ion Source

Wednesday, November 15, 2006, 8:00 am, Room 2005

Session: Molecular Ion Sources and Characterization of Biomaterials
Presenter: C.M. Mahoney, National Institute of Standards and Technology
Correspondent: Click to Email
The utility of cluster Secondary Ion Mass Spectrometry (SIMS) for depth profiling applications in polymeric materials has been repeatedly demonstrated in the past decade, where it has been used to obtain molecular and fragment information as a function of depth in several polymer systems.@footnote 1,2,3,4@ In addition to homopolymers, polymeric blends, multilayers and copolymer systems have been successfully characterized as a function of depth.@footnote 2,4@ Finally, the capability to monitor the in-depth distribution of small molecules embedded in organic and polymeric matrices has been realized.@footnote 1,5@ This talk will describe the ongoing research efforts at NIST to further develop cluster SIMS as a tool for polymer surface and in-depth characterization. Results indicate that SF@sub 5@@super +@ is a promising tool for polymer depth profiling, and with the right set of conditions, including temperature, sample rotation and selection of analysis source, one can obtain optimal results. @FootnoteText@ @footnote 1@ Mahoney, C.M.; Roberson, S.V.; Gillen, G. Anal. Chem. 2004, 76, 3199-3207.@footnote 2@ Mahoney, C.M.; Yu, J.X.; Gardella, J.A. Jr. Anal. Chem. 2005, 77 (11), 3570-3578.@footnote 3@ Wagner, M.S. Surf. Interface Anal. 2005, 37(1), 42-70.@footnote 4@ Wagner, M.S. Anal. Chem. 2005. 77(3), 911-922.@footnote 5@ Chen, J.; Winograd, N. Anal. Chem. 2005, 77(11), 3651-3659.