AVS 52nd International Symposium
    Surface Science Thursday Sessions

Session SS2-ThM
Functionalization of Semiconductor Surfaces

Thursday, November 3, 2005, 8:20 am, Room 202
Moderator: J.E. Crowell, University of California, San Diego


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Click a paper to see the details. Presenters are shown in bold type.

8:20am SS2-ThM1
Dissociative Chemisorption of SiH@sub 4@ on Si(100): Threshold Energy and Mechanism
H.L. Abbott, University of Virginia, D.F. Kavulak, University of California, Berkeley, I. Harrison, University of Virginia
8:40am SS2-ThM2
Organic Functionalization of Semiconductors Using Amino Acids; Quantum Resonance Coupling and Electron Transport Effects
G.D. Guilluame, G. Zhang, C.B. Musgrave, Stanford University
9:00am SS2-ThM3
Amide Chemistry at the Ge(100)-2x1 Interface
A.J. Keung, M.A. Filler, S.F. Bent, Stanford University
9:20am SS2-ThM4
Layer-by-Layer Growth on Ge(100) via Spontaneous Chemical Reaction
A. Kim, Korea Advanced Institute of Science and Technology (KAIST), Korea, M.A. Filler, S.F. Bent, Stanford University, S. Kim, KAIST, Korea
9:40am SS2-ThM5
Alkylation of Silicon and Germanium Surfaces
S. Rivillon, Y.J. Chabal, Rutgers University
10:00am SS2-ThM6
Correlation of Surface Electronic Structure with Organic Reactivity on Si(114)
D.E. Barlow, A.R. Laracuente, L.J. Whitman, J.N. Russell, Naval Research Laboratory
10:20am SS2-ThM7 Invited Paper
Contact Formation with a Single Molecule: 1,3-cyclohexadiene on the Si(100) Surface
B. Naydenov, L.C. Teague, P. Ryan, J.J. Boland, Trinity College Dublin, Ireland
11:00am SS2-ThM9
Surface Functionalization of Si(100)2x1 by Halogenated Ethylenes: Formation of C2-dimer, Vinylene, Vinylidene, and their Halogenated Derivatives
K.T. Leung, X.J. Zhou, University of Waterloo, Canada
11:20am SS2-ThM10
Infrared Spectroscopy Study of Adsorption of Maleic Anhydride on Si(100)
Y. Kimura, H. Ishii, M. Niwano, Tohoku University, Japan
11:40am SS2-ThM11
Formation of Unsaturated Hydrocarbon Moieties on Hydrogen-terminated Si(111) by Grignard Reaction
T. Yamada, K. Shirasaka, M. Noto, H.S. Kato, RIKEN, Japan, M. Kawai, RIKEN and The University of Tokyo, Japan