| AVS 52nd International Symposium | |
| Surface Science | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | SS1-FrM1 Invited Paper Creating Si Structures from Meso- to Nano-scale via Chemical and Laser-Assisted Methods K.W. Kolasinski, University of Virginia |
| 9:00am | SS1-FrM3 Optical Second Harmonic Generation as a Diagnostic Tool in Ar@super +@ and XeF@sub 2@ Beam Etching Studies of Silicon J.J.H. Gielis, A.A.E. Stevens, P.M. Gevers, H.C.W. Beijerinck, M.C.M. Van De Sanden, W.M.M. Kessels, Eindhoven University of Technology, The Netherlands |
| 9:40am | SS1-FrM5 157 nm Laser Interactions with Fused Silica@footnote 1@ S.R. John, J.A. Leraas, S.C. Langford, J.T. Dickinson, Washington State University |
| 10:00am | SS1-FrM6 Ion-induced Initiation of Defects on Graphite at Hyperthermal Beam Energies X. Liu, T. Tzvetkov, X.D. Qin, D.C. Jacobs, University of Notre Dame, N. Mateljevic, J.C. Tully, Yale University |
| 10:20am | SS1-FrM7 Etching of Carbonaceous Thin Films by Atomic Oxygen: The Influence of Chemical Composition, Substrate Temperature and Gas Phase Environment H. Fairbrother, J. Gorham, Johns Hopkins University |
| 10:40am | SS1-FrM8 Consequences of Exposing Ionic Single Crystals to UV Laser Light, keV Electrons, and Low Pressure Water Vapor@footnote 1@ J.T. Dickinson, K. Kjelgaard, S.C. Langford, Washington State University |