| AVS 52nd International Symposium | |
| Advanced Surface Engineering | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| SE-TuP1 HPPMS Growth of High Sputtering Yield Metallic Films S.L. Rohde, University of Nebraska, D.J. Christie, Advanced Energy, S. Sevvana, S. Chennadi, D.M. Mihut, J. Li, University of Nebraska |
| SE-TuP2 Low Temperature Deposition of @alpha@-Al@sub 2@O@sub 3@ by Plasma Chemical Vapor Deposition D. Kurapov, J.M. Schneider, RWTH Aachen, Germany |
| SE-TuP3 Laser Processing of Crystalline Technologically Relevant Glass-Forming Alloys for Enhanced Corrosion Resistance J.M. Fitz-Gerald, J.G. Hoekstra, M.A. Jakab, S.J. Poon, G.J. Shiflet, J.R. Scully, University of Virginia |
| SE-TuP4 Structure and Bonding of V@sub 2@AlC Studied by Theoretical and Experimental Means J.M. Schneider, R. Mertens, D. Music, RWTH Aachen, Germany |