| AVS 52nd International Symposium | |
| Manufacturing Science and Technology | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | MS-TuA1 Invited Paper Magnetoresistive Random Access Memory - Manufacturing Challenges G.W. Grynkewich, B. Butcher, J. Chan, W. Feil, G. Kerszykowski, K. Kyler, J. Martin, J. Molla, K. Nagel, J. Ren, K. Smith, J.-J. Sun, R. Williams, Freescale Semiconductor, Inc. |
| 2:40pm | MS-TuA3 Controlling Ultrashallow Junction Formation through Surface Chemistry E.G. Seebauer, K. Dev, C.T.M. Kwok, R.D. Braatz, University of Illinois at Urbana-Champaign |
| 3:00pm | MS-TuA4 Investigation of Boron Penetration through Poly Silicon Films X.-D. Wang, W. Fan, S. Phillips, J. Parker, S. Schauer, Freescale Semiconductor |
| 3:20pm | MS-TuA5 Investigation of Low-k Dielectric Etching using Groovy ICP Plasma Source A. Kelly, G.K. Vinogradov, FOI Corporation, Japan |