AVS 52nd International Symposium
    Thin Films Tuesday Sessions
       Session TF-TuM

Paper TF-TuM2
Characteristics of Atomic Layer Deposited TiO@sub2@ Films and its Photocatalytic Activity

Tuesday, November 1, 2005, 8:40 am, Room 306

Session: Atomic Layer Deposition - Oxides
Presenter: D.H. Kim, Chonnam National University, South Korea
Authors: D.H. Kim, Chonnam National University, South Korea
R. Pheamhom, Chonnam National University, South Korea
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Titanium dioxide has many attractive physicochemical properties and thus lends itself to various applications such as optical coatings for anti-reflection, high dielectric layers for electronic devices, biocompatible coatings for biomaterials, and photosensitive layers for photocatalysts and solar cells. In this work, tetrakis(dimethylamido) titanium (TDMAT) has been evaluated as a possible precursor for TiO@sub 2@ ALD using H@sub 2@O@sub 2@ as a counter-reactant. We have explored the effects of deposition temperature, reactants pulse and purging time on the film growth rate to optimize the ALD process for TiO@sub 2@ preparation using TDMAT. Self-limiting reaction was possible, as supported by saturated film growth rate and the linear property of the film growth depending on the number of cycles. Film growth rate, surface morphology, crystallinity, and conformality on the deposition temperature along with the photocatalytic activity of the ALD TiO@sub 2@ in decomposing methylene blue in aqueous solution will be presented.