AVS 52nd International Symposium
    Nanometer-Scale Science and Technology Monday Sessions
       Session NS2-MoA

Paper NS2-MoA4
AFM Investigation of the Growth of Self-Assembled MOSUD Layers

Monday, October 31, 2005, 3:00 pm, Room 210

Session: Nanometer Scale Assembly
Presenter: T.Y. Shih, University of Southern California
Authors: T.Y. Shih, University of Southern California
B.E. Koel, University of Southern California
A.A.G. Requicha, University of Southern California
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Designed fabrication of structures on a nanometer scale often requires progress in the efficiency and control in deposition of self-assembled monolayers, especially in an approach that we have called layered nanofabrication (LNF). We report results demonstrating controlled growth of layers of (10-carbomethoxydecyldimethylchlorosilane) MOSUD that are used for embedding and planarizing patterns of Au nanoparticles. These studies of the growth of self-assembled monolayers of MOSUD extend previous investigations of modification of silicon surfaces by silane adsorption. In particular, we studied the influence of an anchor layer for stabilizing the Au nanoparticles. Atomic force microscopy (AFM) was used ex-situ to characterize the formation and quality of self-assembled mono and multilayers. In addition, ellipsometry was used to monitor the MOSUD film thickness and characterize the film growth mode. Growth of layers with a uniform packing and constant height could be obtained and the film thickness could be increased without covering the Au nanoparticles.