AVS 52nd International Symposium
    Nanometer-Scale Science and Technology Tuesday Sessions
       Session NS-TuP

Paper NS-TuP5
Compositional and Structural Characterization of Tungsten Nanostructures Produced by Electron Beam-Induced Deposition

Tuesday, November 1, 2005, 4:00 pm, Room Exhibit Hall C&D

Session: Nanometer Scale Science and Technology Poster Session
Presenter: K.L. Klein, University of Tennesse & ORNL
Authors: K.L. Klein, University of Tennesse & ORNL
S.J. Randolph, University of Tennessee
P.D. Rack, University of Tennessee
M.L. Simpson, University of Tennessee & ORNL
Correspondent: Click to Email
Electron beam-induced deposition (EBID) is an emerging technique for the synthesis of nanostructures and nanopatterning. The high degree of precision associated with EBID, (i.e. precise location, size, and shape) makes it a prime candidate for a wide variety of applications ranging from fiber tips for field emission sources to lithography mask repair strategies. Furthermore, a wide array of materials - as governed by the choice of precursor gas - can be deposited by EBID, thus adding to the versatility of the technique. As is the case with all deposition processes, it is critical to be able to control the composition and structure of the deposited material by varying simple process parameters. Thus far there has been very little characterization of the chemical composition and internal structure of EBID materials. Previous results have suggested a significant incorporation of impurities into the deposited material. The deposition conditions as well as precursor composition can impact the resulting chemical composition and nanostructural properties of the deposit. In order to better control these deposit properties, we report on the effects of beam energy, beam current, and localized precursor pressure on tungsten nanostructures deposited by EBID from a tungsten hexafluoride precursor. The results of high resolution TEM, STEM, and EDS on as-deposited tungsten nanostructures will be reported. In addition, the effects of post-deposition processes, such as thermal treatments will be discussed.