AVS 52nd International Symposium
    Applied Surface Science Monday Sessions
       Session AS-MoP

Paper AS-MoP6
Structural Analysis of a DTHXBQ/Pt(dmg)@sub 2@ on KBr Plate used by TRXPS

Monday, October 31, 2005, 5:00 pm, Room Exhibit Hall C&D

Session: Aspects of Applied Surface Science Poster Session
Presenter: Y. Iijima, JEOL Ltd., Japan
Authors: T. Tazawa, JEOL Ltd., Japan
Y. Iijima, JEOL Ltd., Japan
S. Isoda, Kyoto University, Japan
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Recently, with development of thin film technique, analysis of the molecular film which did lamination in a structural analysis of monomolecular film and thickness of several nm has been demanded from X-ray photoelectron spectrometer (XPS). Because this material is formed on flat plate, such as silicon wafer, it is possible to measure with total reflection x-ray photoelectron spectrometer (TRXPS). A location of standing wave changes when it changes in X-ray incidence angle in TRXPS. This change does intensity change of photoelectron intensity, and it is observed. Variation that is to say occurs in photoelectron intensity by an entity location, a difference of angle in the same functional group. Firstly film formation did Pt(dmg)@sub 2@ in thickness of 15nm on KBr plate by this study, and DTHXBQ film (organic compound) formed on that film, after that we measured this organic compound film used by TRXPS. Measurement changed incidence X-rays from 10° to 0°, and we measured photoelectron intensity-dependence of Pt4f, O1s, C1s and N1s for incidence angle of x-ray. The insturment which we used for measurement is JPS-9200 (JEOL Ltd.). Measurement condition is as follows. Excitation x-ray is AlK@alpha@ monochromatic X-ray, x-ray power in measurement is 300W, and energy resolution is 0.8eV. As a result, we were able to decided a location of Pt in Pt(dmg)2,and a structure of Pt(dmg)@sub 2@ and DTHXBQ films on KBr plate.