| AVS 51st International Symposium | |
| Thin Films | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | TF-WeM1 Optical Properties of Uranium and Thorium-Based Thin Films as Highly Reflective EUV Mirrors D.D. Allred, J.E. Johnson, W.R. Evans, N. Farnsworth, A.E. Baker, R.S. Turley, Brigham Young University |
| 8:40am | TF-WeM2 Determining Physical and Chemical Properties of Sputtered Uranium and Thorium Thin Films Useful as Extreme Ultraviolet Reflectors R.W.L. Larsen, Provo High School, D.D. Allred, Brigham Young University |
| 9:00am | TF-WeM3 Invited Paper Mechanical Characteristics of Optical Films: Their Origin and Evaluation L. Martinu, J.E. Klemberg-Sapieha, Ecole Polytechnique Montreal, Canada |
| 9:40am | TF-WeM5 Improved Optical Heterodyne Detected Transient Grating Method by using a Thin Film Grating K. Okamoto, Z. Zhang, California Institute of Technology, D.T. Wei, Wei & Assoc., A. Scherer, California Institute of Technology |
| 10:00am | TF-WeM6 Infrared Emission from Zinc Sulfide Doped with Rare Earth Fluorides D. DeVito, A. Kale, W. Glass, M. Davidson, P.H. Holloway, University of Florida |
| 10:20am | TF-WeM7 Spectrally Stable Optical Coatings Using Closed Field Reactive Magnetron Sputtering J.M. Walls, D.G. Gibson, Applied Multilayers Ltd, UK |
| 10:40am | TF-WeM8 Multilayered SiN@sub x@/SiO@sub 2@ AR Coatings with Cylindrical Cathode by Unbalanced Compressive Magnetron Sputtering C.-S. Wang, K. Sasaki, Kanazawa University, Japan, S.-F. Chen, National Taipei University of Technology, Taiwan, T. Hata, Center of Optical Coating Research, Japan |
| 11:00am | TF-WeM9 Analysis of a Combined Sputtering and Plasma-Heating-Evaporation Process of Magnesium Fluoride by using Plasma Emission Spectroscopy and Energy Resolved Type Mass Spectrometry T. Deguchi, T. Sasaki, E. Kusano, Kanazawa Institute of Technology, Japan, S. Iura, K. Kawamata, Olympus Co., Ltd., Japan, A. Kinbara, Kanazawa Institute of Technology, Japan |
| 11:20am | TF-WeM10 Silicon-rich Nitride Characterization for Polysilicon Gate Patterning F. Celii, K. Hewes, S. Zheng, E. Mickler, Texas Instruments |
| 11:40am | TF-WeM11 Film Stress and Discharge Properties of MgO protective layer of AC-PDP M.J. Lee, S.Y. Park, S.H. Moon, S.G. Kim, H.J. Kim, Seoul National University, Korea |