| AVS 51st International Symposium | |
| Thin Films | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF-MoA1 Nano-Mechanical Properties of a "Solid Liquid" J.E. Houston, Sandia National Laboratories |
| 2:20pm | TF-MoA2 Structure and Properties of Exothermic Metal Multilayers D.P. Adams, C. Tigges, M.A. Rodriguez, T. Buccheit, Sandia National Laboratories |
| 2:40pm | TF-MoA3 Invited Paper A Nanometrics Feasibility Approach to Reliable Devices W.W. Gerberich, W.M. Mook, J.M. Jungk, M.J. Cordill, University of Minnesota |
| 3:20pm | TF-MoA5 Properties and Applications of Boron Carbide Thin Films Y. Chen, C.A. Freyman, Y.-W. Chung, Northwestern University |
| 3:40pm | TF-MoA6 Mechanical Stress in PVD Deposited Chromium Films G.C.A.M. Janssen, Delft University of Technology, The Netherlands, J.-D. Kamminga, S.Y. Grachev, Netherlands Institute for Metals Research, The Netherlands |
| 4:00pm | TF-MoA7 Development of Zrb@sub 2@ and Hfb@sub 2@ Hard Coatings by CVD from Single Source Precursors S. Jayaraman, E.J. Klein, Y. Yang, L. Nittala, J.R. Abelson, D.Y. Kim, G.S. Girolami, University of Illinois at Urbana-Champaign |
| 4:20pm | TF-MoA8 Effects of Sulfur Addition to Magnetron Sputtered a-C:H Thin Films C.A. Freyman, Y.-W. Chung, Northwestern University |
| 4:40pm | TF-MoA9 RF MEMS Beam Stiffness Measurement Using Nanoindentation J. Vella, S. Pacheco, P. Zurcher, Freescale Semiconductor |
| 5:00pm | TF-MoA10 Effect of Trimethylsilylation on the Film Stress of Nanoporous Silica Ultralow-k Film Stacks F.M. Pan, National Chiao Tung University, Taiwan, A.T. Cho, National Nano Devices Laboratories, Taiwan, J.Y. Chen, L. Chang, National Chiao Tung University, Taiwan, K.J. Chao, National Tsing Hua Univerisity, Taiwan |