AVS 51st International Symposium
    Thin Films Monday Sessions
       Session TF-MoA

Paper TF-MoA8
Effects of Sulfur Addition to Magnetron Sputtered a-C:H Thin Films

Monday, November 15, 2004, 4:20 pm, Room 303C

Session: Mechanical Properties of Thin Films
Presenter: C.A. Freyman, Northwestern University
Authors: C.A. Freyman, Northwestern University
Y.-W. Chung, Northwestern University
Correspondent: Click to Email
Amorphous hydrogenated carbon films (a-C:H) have shown ultra low friction coefficients (µ<0.01) in dry nitrogen testing environments. The ultra low friction properties degrade with the addition of water vapor to the testing environment. In this work, we explore the effects of sulfur addition to magnetron sputtered a-C:H films on elastic modulus, hardness and tribological properties as a function of relative humidity in the testing environment. Film microstructure and chemical state of sulfur have been investigated with transmission electron microscopy and electron energy loss spectroscopy. Hydrophobicity of these films are obtained via contact angle measurements. These studies show that with appropriate control of the film-substrate interface, sulfur addition of a few atomic percent is sufficient to reduce the adverse effect of humidity on friction.