| AVS 51st International Symposium | |
| Surface Science | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | SS2-WeA1 Atomic-Scale Analysis of the SiH@sub 3@ Surface Reactivity During Plasma Deposition of Amorphous Silicon Thin Films M.S. Valipa, E.S. Aydil, University of California, Santa Barbara, D. Maroudas, University of Massachusetts, Amherst |
| 2:20pm | SS2-WeA2 Adsorption Induced Phase Separation followed in Real Time by High-pressure Scanning Tunneling Microscopy J. Knudsen, R.T. Vang, E.K. Vestergaard, F. Besenbacher, University of Aarhus, Denmark |
| 2:40pm | SS2-WeA3 Invited Paper Quantum State Resolved Studies of Gas/Surface Reaction Dynamics R.D. Beck, Ecole Polytechnique Federale de Lausanne (EPF), Switzerland |
| 3:20pm | SS2-WeA5 Gas-Surface Reaction Dynamics at the Inorganic-Organic Interface A. Dube, P.F. Ma, A.S. Killampalli, M. Sharma, J.R. Engstrom, Cornell University |
| 3:40pm | SS2-WeA6 Site-Selective Abstraction in the Reaction of 5- to 20-eV O@super +@ with a Self-Assembled Monolayer X. Qin, T.D. Tzvetkov, D.C. Jacobs, University of Notre Dame, D. Lee, L. Yu, University of Chicago |
| 4:00pm | SS2-WeA7 Invited Paper Current Research and Development Topics on Gas Cluster Ion Beam Processes I. Yamada, University of Hyogo, Japan |