| AVS 51st International Symposium | |
| Surface Science | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | SS2-MoM1 Atomic-level Control of Chemical Properties of Si(100) with Dopant Impurities Y. Wang, G.S. Hwang, The University of Texas at Austin |
| 8:40am | SS2-MoM2 Chemistry on Surfaces of Thin Films and at Thin Film/Silicon Buried Interface: Vinyltrimethylsilane and (hfac)Cu(VTMS) on Si(100)-2x1 and on TiCN/Si(100) A.V. Teplyakov, L. Pirolli, University of Delaware |
| 9:00am | SS2-MoM3 Invited Paper Functionalization of Semiconductor Surfaces M.A. Filler, D.W. Porter, Stanford University, A. Kim, KAIST, Korea, J.A. Van Deventer, S.F. Bent, Stanford University |
| 9:40am | SS2-MoM5 Adsorption of Amines on Germanium and Silicon Surfaces P. Prayongpan, C.M. Greenlief, University of Missouri-Columbia |
| 10:00am | SS2-MoM6 Silicon Surface Chemistry of Substituted Triazines S.M. Casey, L.M. LeMond, University of Nevada, Reno |
| 10:20am | SS2-MoM7 Carbonyl Chemistry at the (100)-2x1 Semiconductor Interface M.A. Filler, S.F. Bent, Stanford University |
| 10:40am | SS2-MoM8 Adsorption of Chiral Enantiomers of 2,3 butanediol on Si(100) J.W. Kim, Fritz-Haber-Institute der MPG, Germany, M. Carbone, Universita Tor Vergata, Italy, M. Tallarida, J.H. Dil, K. Horn, Fritz-Haber-Institute der MPG, Germany, M.P. Casaletto, Instituto per lo Studio die Materiali Nanostrutturati ISMN, Italy, R. Flammini, Istituto de Metodologie Inorganiche e dei Plasmi CNR, Italy, M.N. Piancastelli, Universita Tor Vergata, Italy |
| 11:00am | SS2-MoM9 Self Assembly on Si(114)-(2x1): Molecular Attachment Via Alkene Functional Groups D.E. Barlow, A.R. Laracuente, L.A. Baker, L.J. Whitman, J.N. Russell, Jr., Naval Research Laboratory |
| 11:20am | SS2-MoM10 Adsorption of Cata-condensed Aromatic Compounds on Si(100) K. Okamura, Y. Hosoi, Y. Kimura, H. Ishii, M. Niwano, Tohoku University, Japan |
| 11:40am | SS2-MoM11 Ideal Methyl Termination of the Si(111) Surface T. Yamada, M. Kawai, RIKEN, Japan, A. Wawro, Polish Academy of Sciences, Poland, S. Suto, A. Kasuya, Tohoku University, Japan |