AVS 51st International Symposium
    MEMS and NEMS Tuesday Sessions

Session MN+MS+PS+TF-TuA
Nano/MEMS Manufacturing and Plasmas

Tuesday, November 16, 2004, 1:20 pm, Room 213C
Moderator: R. Ghodssi, University of Maryland


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

1:20pm MN+MS+PS+TF-TuA1 Invited Paper
Wafer-Level, Low-Cost, High-Vacuum Packaging of MEMS Devices Using Nanogetter TM
N. Najafi, D.S. Sparks, Integrated Sensing Systems, Inc. (ISSYS)
2:00pm MN+MS+PS+TF-TuA3
Low-Pressure and Plasma-Enhanced Chemical Vapor Deposition Modeling at the Feature Length Scale of MEMS Devices
L.C. Musson, Sandia National Laboratories, P. Ho, Reaction Design, R.C. Schmidt, Sandia National Laboratories
2:20pm MN+MS+PS+TF-TuA4
Detection of Metal Film Deposit Smoothness by a MEMS-NEMS Structure via Surface Plasmon Effects
D.T. Wei, Wei & Assoc., A. Scherer, California Institute of Technology
2:40pm MN+MS+PS+TF-TuA5
Etching of High Aspect Ratio Structures in Si using SF@sub 6@-O@sub 2@-HBr and SF@sub 6@-O@sub 2@-Cl@sub 2@ Plasmas
S. Gomez, J. Belen, University of California, Santa Barbara, M. Kiehlbauch, Lam Research Corporation, E.S. Aydil, University of California, Santa Barbara
3:00pm MN+MS+PS+TF-TuA6
Deep Reactive Ion Etching of Silicon Structures for Profile and Morphology Control
R.J. Shul, M.G. Blain, S.G. Rich, S.A. Zmuda, Sandia National Laboratories
3:20pm MN+MS+PS+TF-TuA7
Fabrication of Wide-IF 200-300 GHz SIS Mixers with Suspended Metal Beam Leads Formed on SOI
A.B. Kaul, B. Bumble, K.A. Lee, H.G. LeDuc, Jet Propulsion Laboratory, California Institute of Technology, F. Rice, J. Zmuidzinas, California Institute of Technology
3:40pm MN+MS+PS+TF-TuA8
Characterization of Polycrystalline AlN Film Quality Using Variable Angle Spectroscopic Ellipsometry
L.-P. Wang, D.S. Shim, Q. Ma, V.R. Rao, E. Ginsburg, A. Talalyevsky, Intel Corp