AVS 51st International Symposium
    Applied Surface Science Monday Sessions
       Session AS-MoP

Paper AS-MoP19
Preparation and Lithography of Monolayers on Silicon Surface and Their Molecular Recognition

Monday, November 15, 2004, 5:00 pm, Room Exhibit Hall B

Session: Poster Session
Presenter: Y. Takahashi, Waseda University, Japan
Authors: Y. Takahashi, Waseda University, Japan
N. Shirahata, National Institute for Materials Science, Japan
A. Hozumi, National Institute of Advanced Industrial Science and Technology, Japan
S. Asakura, Waseda University, Japan
T. Yonezawa, University of Tokyo, Japan
Correspondent: Click to Email
Functionalization of hydrated silicon surface is a starting stage in the development of molecular, biomolecular and semiconductor devices. Refluxing of 1-alkene under nitrogen with H-terminated Si gives an uniform Si-C linked monolayer with atomically flatness through thermal hydrosilylation. We have reported that the monolayer can be prepared from a dilute solution of 1-alkene (< 1 wt%) and even from powder of 1-alkene molecules. This basic finding that the monolayer can be prepared from the powder implies that solid materials, including those with exceedingly high melting points or no melting points, have the potential to be transformed into monolayers directly bonded to inorganic substrates, with the only limitation being that the material must be soluble into any kinds of solvents. The carbohydrate monolayer recognizes the specific protein molecules selectively. Lithography of such monolayer can be done by UV-light irradiation. Furthermore, the particle monolayer of alkenethiol-stabilized gold nanoparticles were also be anchored onto silicon by similar reaction. These findings will promise that individual nanoscale materials can be manipulated based on monolayer formation mechansm.