| AVS 50th International Symposium | |
| Thin Films | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF-TuA1 Enhanced Conductivity in Post Deposition Annealed Spinel Oxide Films G.J. Exarhos, Pacific Northwest National Laboratory, R.R. Owings, University of Florida, C.F. Windisch, Pacific Northwest National Laboratory, P.H. Holloway, University of Florida |
| 2:20pm | TF-TuA2 Reactive-Environment, Hollow Cathode Sputtering: Basic Characteristics and Application to Al@sub 2@O@sub 3@ and Doped ZnO A.E. Delahoy, S.Y. Guo, Energy Photovoltaics, Inc. |
| 2:40pm | TF-TuA3 Invited Paper Transparent Electronics: An Overview of Materials, Devices, and Applications J.F. Wager, H.Q. Chiang, D. Hong, B.J. Norris, J.P. Bender, M.M. Valencia, C.-H. Park, J. Anderson, J.Y. Jeong, D.A. Keszler, H. Yanagi, M. Price, J. Tate, Oregon State University, R.L. Hoffman, Hewlett-Packard Company |
| 3:20pm | TF-TuA5 Expanding Thermal Plasma Deposition of Textured ZnO: Plasma Processes and Film Growth R. Groenen, I.M. Volintiru, M. Creatore, M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands |
| 3:40pm | TF-TuA6 Transparent Conducting Amorphous Zn-Sn-O Films Deposited by Simultaneous DC Sputtering T. Moriga, Y. Hayashi, K. Kondo, K. Matsuo, H. Fukumoto, K. Murai, K. Tominaga, I. Nakabayashi, The University of Tokushima, Japan |
| 4:20pm | TF-TuA8 Highly Transparent and Conductive ZnO:Al Thin Films Prepared by Vacuum Arc Plasma Evaporation T. Miyata, S. Ida, Y. Minamino, T. Minami, Kanazawa Institute of Technology, Japan |