AVS 50th International Symposium
    Plasma Science and Technology Wednesday Sessions

Session PS1-WeA
Mechanisms in Plasma-Surface Interactions

Wednesday, November 5, 2003, 2:00 pm, Room 314
Moderator: E. Kessels, Eindhoven University of Technology, The Netherlands


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Click a paper to see the details. Presenters are shown in bold type.

2:00pm PS1-WeA1 Invited Paper
PECVD of Thin Films: The Study of the Plasma-surface Interaction by Means of In Situ Plasma and Film Diagnostics
M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands
2:40pm PS1-WeA3
Plasma Nitriding and Reactive Deposition in Electron Beam Generated Plasmas*
C. Muratore, D. Leonhardt, S.G. Walton, D.D. Blackwell, R.F. Fernsler, R.A. Meger, Naval Research Laboratory
3:00pm PS1-WeA4
Angular Dependence of SiO@sub 2@, Si and Si@sub 3@N@sub 4@ Etch Yield in Fluorocarbon Gas Chemistries by using Plasma Beam
K. Kurihara, A. Egami, M. Nakamura, ASET, Japan
3:20pm PS1-WeA5
Reduction Mechanism of VUV Radiation Damages in Pulse-Time-Modulated Plasma Processes
Y. Ishikawa, M. Okigawa, Tohoku University, Japan, S. Yamasaki, National institute of Advanced Industrial Science and Technology, Japan, S. Samukawa, Tohoku University, Japan
3:40pm PS1-WeA6
IRIS Investigations of Gas Phase Species in Fluorocarbon Plasmas
I.T. Martin, E.R. Fisher, Colorado State University
4:00pm PS1-WeA7
Fluorocarbon-based Plasma Etching: The Role of the Energy Distribution of Bombarding Ions
R. Silapunt, S. Williams, A.E. Wendt, University of Wisconsin, Madison, K.H.R. Kirmse, L. Losey, Texas Instruments
4:20pm PS1-WeA8
Investigating the Fundamental Mechanism of Surface Smoothening of Plasma-Deposited Amorphous Silicon Thin Films through Atomistic Simulations
S. Sriraman, S. Agarwal, E.S. Aydil, University of California, Santa Barbara, D. Maroudas, University of Massachusetts, Amherst
4:40pm PS1-WeA9
Study of SiO@sub 2@ Plasma Etching with Off-normal Mass-analyzed CF@sub x@@super +@ Ion Beam Irradiation
K. Yanai, K. Karahashi, K. Ishikawa, M. Nakamura, Association of Super-Advanced Electronics Technologies, Japan
5:00pm PS1-WeA10
Reactive Surface Coefficients for Radicals in a Vacuum Beam System
Y. Kimura, J. Coburn, D. Fraser, H. Winters, D.B. Graves, University of California, Berkeley