AVS 50th International Symposium
    Vacuum Technology Thursday Sessions
       Session VT-ThA

Paper VT-ThA8
Characteristics Evaluation Practice of Predictable Performance Monitoring for Low Vacuum Dry Pumps in the Semiconductor Production Line

Thursday, November 6, 2003, 4:20 pm, Room 323

Session: Industrial Vacuum Applications
Presenter: J.Y. Lim, Korea Research Institute of Standards and Science
Authors: J.Y. Lim, Korea Research Institute of Standards and Science
W.S. Cheung, Korea Research Institute of Standards and Science
J.H. Joo, Sungwon Edwards Ltd., Korea
Y.W. Kim, Samsung Electronics Co. Ltd., Korea
W.G. Sim, Hannam University, Korea
K.H. Chung, Korea Research Institute of Standards and Science
Correspondent: Click to Email
The early prediction system of performance fluctuation for low vacuum dry pumps in the semiconductor process line has been issued since devastating malfunctions or characteristics degradations of dry pumps due to mainly chemical byproducts during the production processes have been occasionally reported in Samsung Electronics. This motivation drove implementing central monitoring system (CMS) to the production facilities. CMS, however, is not a single condition monitoring or a prediction analysis method, but an overall monitoring program with historical performance data only. To compromise with this issue, the real time, in-situ characteristics evaluation system for two Edwards iH600 dry pumps has been established at the Ti/TiN chemical vapor deposition system in the Samsung Electronics production line #10, in which system pump malfunction or degradation mostly happens. The real time data in Samsung Electronics and the experimental reference data from the KRISS characteristics evaluation system@footnote 1@ have been thoroughly compared each other and analyzed to ascertain if there exist unusual degradation symptoms such as in pumping speed, power consumption, vibration, noise, etc. The integrated data at the actual process pressure range of about 1 to 10 mbar and experimental measurement rage of about 100 to 10@super -3@ mbar are time-synchronized with respect to the inlet pressure in a scientific manner of coincidence. In this recent work, we report the first significant results of the method of characteristics synchronization between the laboratory and process line in the way of the pump malfunction or degradation symptom to be clearly diagnosed and positively protected during the production process. @FootnoteText@@footnote 1@J.Y. Lim, S.H. Chung, W.S. Cheung, K.H. Chung, Y.H. Shin, S.S. Hong, W.G. Sim, Expanded Characteristics Evaluation for Low Vacuum Dry Pumps, AVS 49th International Symposium, November 4, 2002, Denver, CO, USA.