AVS 50th International Symposium
    Thin Films Wednesday Sessions
       Session TF-WeP

Paper TF-WeP29
Synthesis and Electrochemical Characteristics of Boron Carbon Nitride Films Deposited by Magnetron Sputtering

Wednesday, November 5, 2003, 11:00 am, Room Hall A-C

Session: Poster Session
Presenter: E. Byon, Korea Institute of Machinery and Materials
Authors: E. Byon, Korea Institute of Machinery and Materials
M. Son, Samgsung Techwin Co. Ltd, Korea
N. Hara, Tohoku University, Japan
K. Sugomoto, Tohoku University, Japan
S.-K. Kwon, Korea Institute of Machinery and Materials
Correspondent: Click to Email
Boron-Carbon-Nitrogen (BCN) system is an attractive ternary material since it has not only an extremely high hardness but also a number of other prominent characteristics such as chemical inertness, and low thermal expansion. In this paper, we prepared ternary BC@sub x@N@sub y@ films on Si by r.f. magnetron sputtering of boron and graphite targets. With increasing of the graphite target power, FTIR and XPS showed that the structure of the BC@sub x@N@sub y@ films was changed from the cubic BCN to the hexagonal BCN. The corrosion resistance of BCN thin films in aqueous solution was investigated. BCN films with different composition were deposited on a platinum plate in the thickness range of 150-280 nm. In order to understand effect of pH of solutions on the corrosion resistance of the film, BC@sub 2.4@N samples were immersed in 1 M HCl, NaCl and NaOH at 298 K respectively. BCN films with different carbon content were also immersed at 1 M NaOH solutions to investigate effect of chemical composition on the corrosion resistance. The thinning rate of the film thickness was measured at various potentials in 1 M NaCl by using in-situ ellipsometry. From the results, the corrosion resistance of B@sub 1.0@C@sub 2.4@N@sub1.0@ films were NaOH>NaCl>HCl in that order. With increasing carbon content in BCN films, the corrosion resistance of BCN films is enhanced. The lowest corrosion rate was obtained for B@sub 1.0@C@sub(3.2-4.4)@N@sub 1.2@ films. The anodic polarization in 1 M H@sub 2@SO@sub 4@, 1 M HCl and 1 M NaCl showed similar behavior with Pt substrate. Hydrogen overvoltage in the cathodic region was higher than Pt substrate. No active dissolution of the films was occurred in the range of –0.2 V to 0.1 V of potential in 1 M NaOH, but the film thickness reduced with increasing potential. The current density of the films is directly proportional to the dissolution rate of B1.0C2.4N1.0 film over 0.2 V of potential.