AVS 50th International Symposium
    Thin Films Wednesday Sessions
       Session TF-WeP

Paper TF-WeP19
Deposition of ZnO:Al Gradient Composite Films Using Dual Magnetron Sputtering

Wednesday, November 5, 2003, 11:00 am, Room Hall A-C

Session: Poster Session
Presenter: H.S. Jeong, ITM Inc., Korea
Authors: H.S. Jeong, ITM Inc., Korea
H.J. Lee, ITM Inc., Korea
M.S. Hwang, ITM Inc., Korea
Y.W. Seo, ITM Inc., Korea
S.J. Kwon, Kyungwon University, Korea
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ZnO:Al films with compositional gradient were prepared by dual magnetron sputter deposition technique of in-line sputter system. The films of compositional gradients are achieved by the angle of dual magnetron sources and the moving direction of carrier substrate. The symmetric pulse mode of the power supply(IAP1010, ITM, Inc.) was used to simultaneously sputter a ZnO target and an Al target. We varied the duty of the pulses to control the ratio of ZnO:Al in the thin films. The electrical and optical properties of the films were measured with a surface profiler, an UV/Visible spectrophotometer, a 4-point probe, X-ray diffraction spectroscopy, and atomic force microscopy. Also to observe the depth profile of the compositional gradient film, the film was analyzed by Auger Electron Spectroscopy. The special attention is paid to the surface roughness, electrical resistance, and optical transmittance.