AVS 50th International Symposium
    QSA-10 Topical Conference Tuesday Sessions
       Session QS-TuP

Paper QS-TuP12
Physically Measuring Thickness' of Thin Films via Atomic Force Microscopy: Design and Use of The Abruptor

Tuesday, November 4, 2003, 5:30 pm, Room Hall A-C

Session: Aspects of Quantitative Surface Analysis
Presenter: D. Allred, Brigham Young University
Authors: G. Acosta, Brigham Young University
D. Allred, Brigham Young University
R. Davis, Brigham Young University
Correspondent: Click to Email
In our research of thin films (typically our films are 2.5-15 nm thick), we invest a great deal of time and energy in characterizing our films' physical and optical properties. We have found that it is imperative to have the ability to determine, with confidence, the thickness of our films when we try to describe a material's optical performance, especially true for work in the extreme ultraviolet. Unfortunately, we've learned this is not as simple a task as it would seem. Methods that are optical in nature used to determine how thick a film become more difficult to employ and less effective for very thin films. We would much rather be able to use an AFM to physically measure a film's thickness. Having spent two years refining such a technique, we are happy to report the method we have developed. Our technique involves using a rigidly supported, stainless steel razor blade to mask the substrate during deposition, leaving a distinct, abrupt edge when removed. The device is named the Abruptor. In addition to now being able to determine the thickness of our films, we also offer a side note regarding hydrocarbon contamination of substrates (on the sub-nanometer scale) from exposure to ambient.