AVS 50th International Symposium
    Applied Surface Science Wednesday Sessions
       Session AS-WeP

Paper AS-WeP9
Analysis of Silane Coupling Compound Monomolecular layer on Sapphire Glass used by TRXPS

Wednesday, November 5, 2003, 11:00 am, Room Hall A-C

Session: Poster Session
Presenter: Y. Iijima, JEOL Ltd., Japan
Authors: T. Tazawa, JEOL Ltd., Japan
C. Mochizuki, University of Yamanashi, Japan
M. Shibata, University of Yamanashi, Japan
Y. Iijima, JEOL Ltd., Japan
Correspondent: Click to Email
Recently, the material which spreads silane coupling compound is actively researched. This material is usually applied to the fabrication of chip level interconnects, ohmic contacts, and printed circuit boards, and plating. Moreover, the application to life sciences is expected as for this compound However, the thickness of silane coupling compound is very thin. In general, silane coupling compound is used by one or two molecular layers.Therefore, the analysis of interface between silane coupling compound and the base material surface becomes important. The interface and surface for this material is useful analyzed with XPS, because silane coupling compounds are organic compounds. It is difficult to measure interface information accurately in a normal XPS analysis, because the thickness of silane coupling compound is thin. There is total x-ray reflection photoelectron spectroscopy (TRXPS) as a method of solving this problem. The use of x-ray total reflection has become noteworthly in photoelectron spectroscopy. The angular dependence of photoelectron peak intensities corresponds to the position change in the standing wave was caused by change in the x-ray glancing angle. Especially, at the measurement of multi-layer film and/or monomolecular layer formed on glass or Si wafer, because the belly and the paragraph position of standing wave of x-ray can be adjusted in such a way that they coincide with the respective layer position by changing the glancing angle. In this work, we examined silane coupling compounds monomolecular formed on sapphire glass measured by TRXPS. The profile of photoelectron intensity was observed to grazing incidence x-ray with C and Si. As the result, it is observed that the island structure of silane coupling compounds formed on the glass surface.