AVS 50th International Symposium
    Applied Surface Science Friday Sessions
       Session AS-FrM

Paper AS-FrM2
TOF-SIMS with Polyatomic Primary Ion Bombardment: A Comparison Between Different Projectiles

Friday, November 7, 2003, 8:40 am, Room 324/325

Session: SIMS
Presenter: R. Möllers, ION-TOF GmbH, Germany
Authors: R. Möllers, ION-TOF GmbH, Germany
F. Kollmer, ION-TOF GmbH, Germany
D. Rading, ION-TOF GmbH, Germany
M. Terhorst, ION-TOF GmbH, Germany
E. Niehuis, ION-TOF GmbH, Germany
R. Kersting, Tascon GmbH, Germany
B. Hagenhoff, Tascon GmbH, Germany
Correspondent: Click to Email
In the past TOF-SIMS has been established as an analytical technique for the chemical characterization of surfaces. In particular the simultaneous detection of atomic as well as molecular ions, and the ability to obtain these information laterally resolved, makes this technique well suited for the analysis of structured molecular surfaces. Recently it was shown that polyatomic primary ion bombardment (e.g. SF@sub 5@@super +@, C@sub 60@@super +@, Au@sub n@@super +@-clusters,...) leads to a considerable enhancement of the secondary ion emission efficiency for organic materials. This enhancement not only increases the sensitivity for molecular species up to several orders of magnitude, but also pushes the useful lateral resolution in organic imaging down to the sub-µm range. In this presentation we will continue our systematic investigation on the influence of different primary ion species, including monoatomic as well as polyatomic primary ions, on secondary ion parameters such as yield Y, damage cross section @sigma@, efficiency E = Y/@sigma@, and useful lateral resolution @DELTA@l. Those parameters have been evaluated for a variety of different sample materials and sample preparations. Also the effect of different primary ion energies (4 to 25 keV) will be issued. The results from this investigation will be expanded by examples from routine analysis in a commercial service laboratory.