AVS 49th International Symposium
    Thin Films Thursday Sessions

Session TF-ThA
Ultra Thin Films

Thursday, November 7, 2002, 2:00 pm, Room C-101
Moderator: T.M. Klein, University of Alabama


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm TF-ThA1
Oxidation of InP, Si and SiC Surfaces
Y.J. Chabal, O. Pluchery, F. Amy, M. Frank, K. Raghavachari, Agere Systems
2:20pm TF-ThA2
The Kinetics of Ultrathin Aluminum Oxide Film Growth on Aluminides
J.F. Moore, A. Zinoviev, M.J. Pellin, Argonne National Laboratory
2:40pm TF-ThA3 Invited Paper
Stability of Hafnium Oxide and Silicate Ultrathin Films on Si
I.J.R. Baumvol, Universidade Federal do Rio Grande do Sul, Brazil
3:20pm TF-ThA5
Electrical and Physical Properties of Very Thin, Nearly Epitaxial Cu (100) Sputter-deposited at Room Temperature
C. Detavernier, S.M. Rossnagel, C. Noyan, C. Lavoie, IBM T.J. Watson Research Center, T.S. Kuan, SUNY-Albany, D. Deduytche, R.L. Van Meirhaeghe, Universiteit Gent, Belgium
3:40pm TF-ThA6
Epitaxial Growth of Au and Ag Films on Si(111) using Cu Buffer Layers
K. Pedersen, Aalborg University, Denmark, P. Morgen, University of Southern Denmark, T.G. Pedersen, Aalborg University, Denmark, Z.S. Li, S.V. Hoffmann, Aarhus University, Denmark
4:00pm TF-ThA7
Ag Ultra Thin Film Stability on GaAs (110): An ab-initio Study
D.L. Irving, S.B. Sinnott, University of Florida, R.F. Wood, Oak Ridge National Laboratory
4:20pm TF-ThA8
Synthesis of Ultrasmooth CN@sub x@ Overcoats for 1 Tb/in@super 2@ Magnetic Storage Applications
D.-J. Li, Y.-W. Chung, Northwestern University
4:40pm TF-ThA9
Ultra-thin Silicon- and Aluminum Oxides on Silicon formed Layer-by-layer
P. Morgen, T. Jensen, C. Gundlach, University of Southern Denmark (SDU), K. Pedersen, N. Skiversen, P. Kristiansen, Aalborg University, Denmark, S.V. Hoffman, Z.S. Li, Aarhus University, Denmark
5:00pm TF-ThA10
Characterization of Ultra-Thin Films using Angle Resolved XPS and Maximum Entropy Methods
R. White, R. Champaneria, J. Wolstenholme, P. Mack, Thermo VG Scientific, UK