AVS 49th International Symposium | |
Thin Films | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:00pm | TF-ThA1 Oxidation of InP, Si and SiC Surfaces Y.J. Chabal, O. Pluchery, F. Amy, M. Frank, K. Raghavachari, Agere Systems |
2:20pm | TF-ThA2 The Kinetics of Ultrathin Aluminum Oxide Film Growth on Aluminides J.F. Moore, A. Zinoviev, M.J. Pellin, Argonne National Laboratory |
2:40pm | TF-ThA3 Invited Paper Stability of Hafnium Oxide and Silicate Ultrathin Films on Si I.J.R. Baumvol, Universidade Federal do Rio Grande do Sul, Brazil |
3:20pm | TF-ThA5 Electrical and Physical Properties of Very Thin, Nearly Epitaxial Cu (100) Sputter-deposited at Room Temperature C. Detavernier, S.M. Rossnagel, C. Noyan, C. Lavoie, IBM T.J. Watson Research Center, T.S. Kuan, SUNY-Albany, D. Deduytche, R.L. Van Meirhaeghe, Universiteit Gent, Belgium |
3:40pm | TF-ThA6 Epitaxial Growth of Au and Ag Films on Si(111) using Cu Buffer Layers K. Pedersen, Aalborg University, Denmark, P. Morgen, University of Southern Denmark, T.G. Pedersen, Aalborg University, Denmark, Z.S. Li, S.V. Hoffmann, Aarhus University, Denmark |
4:00pm | TF-ThA7 Ag Ultra Thin Film Stability on GaAs (110): An ab-initio Study D.L. Irving, S.B. Sinnott, University of Florida, R.F. Wood, Oak Ridge National Laboratory |
4:20pm | TF-ThA8 Synthesis of Ultrasmooth CN@sub x@ Overcoats for 1 Tb/in@super 2@ Magnetic Storage Applications D.-J. Li, Y.-W. Chung, Northwestern University |
4:40pm | TF-ThA9 Ultra-thin Silicon- and Aluminum Oxides on Silicon formed Layer-by-layer P. Morgen, T. Jensen, C. Gundlach, University of Southern Denmark (SDU), K. Pedersen, N. Skiversen, P. Kristiansen, Aalborg University, Denmark, S.V. Hoffman, Z.S. Li, Aarhus University, Denmark |
5:00pm | TF-ThA10 Characterization of Ultra-Thin Films using Angle Resolved XPS and Maximum Entropy Methods R. White, R. Champaneria, J. Wolstenholme, P. Mack, Thermo VG Scientific, UK |