AVS 49th International Symposium | |
Plasma Science | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:20am | PS+NT-WeM1 Plasma Enhanced Chemical Vapor Deposition of a Dense SiO@sub 2@ Cap Layer on Low-k Nanostructured Porous Silica Y.B. Jiang, N. Liu, C.J. Brinker, J.L. Cecchi, University of New Mexico |
8:40am | PS+NT-WeM2 RIE processes of Formation of Nanometer-Scale Dot Arrays Y. Zhang, K.W. Guarini, E. Sikorski, C.T. Black, T.J. Dalton, IBM T.J. Watson Research Center |
9:00am | PS+NT-WeM3 Invited Paper Efficient Production of Single-Wall Carbon Nanotubes by Means of the Gravity-free Gas Arc Dischargee T. Mieno, Shizuoka University, Japan, M. Kanai, University of London, UK, H. Shinohara, Nagoya University, Japan |
9:40am | PS+NT-WeM5 Patterned Growth of Vertically Aligned Carbon Nanofibers using a High Density Plasma Enhanced Chemical Vapor Deposition Process J.B.O. Caughman, L.R. Baylor, M.A. Guillorn, V.I. Merkulov, D.H. Lowndes, Oak Ridge National Laboratory |
10:00am | PS+NT-WeM6 Carbon Nanotubes by ICP-CVD: Growth, Characterization, Plasma Diagnostics, and Modeling D.B. Hash, L. Delzeit, K. Matthews, NASA Ames Research Center, B.A. Cruden, Eloret Corporation, M. Meyyappan, NASA Ames Research Center |
10:20am | PS+NT-WeM7 Zinc Oxide Nanowires Grown by Plasma Assisted Chemical Vapor Deposition J.B. Baxter, E.S. Aydil, University of California, Santa Barbara |