| AVS 49th International Symposium | |
| Plasma Science | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:40am | PS+MS-TuM2 High-energy EEDF Tail Detection in High-frequency Discharges J. Kudela, K Suzuki, Y. Nakagawa, Y. Numasawa, ANELVA Corporation, Japan, T. Beppu, RITE, Japan |
| 9:00am | PS+MS-TuM3 Coupled Diagnostic Studies of Plasma Etch Byproducts M.T. Radtke, D.B. Graves, J.W. Coburn, University of California Berkeley |
| 9:20am | PS+MS-TuM4 Two-Dimensional Ion Flux Distributions on the Wafer Surface in Inductively Coupled Plasma Reactors E.S. Aydil, T.W. Kim, University of California, Santa Barbara |
| 9:40am | PS+MS-TuM5 Invited Paper Surface Dependent Effects at the Plasma-Surface Interface G.A. Hebner, Sandia National Laboratories |
| 10:20am | PS+MS-TuM7 Monitoring Sheath Voltages and Ion Energies in High-Density Plasmas using Radio-Frequency Current and Voltage Measurements M.A. Sobolewski, National Institute of Standards and Technology |
| 10:40am | PS+MS-TuM8 Gas Temperature Effects on CF@sub x@ Kinetics in a CF@sub 4@ Inductively Coupled Plasma H. Abada, J.P. Booth, P. Chabert, Ecole Polytechnique, France |
| 11:00am | PS+MS-TuM9 Invited Paper Electron Energy Distribution in C@sub 2@F@sub 4@/CF@sub 3@I Ultrahigh-Frequency and Inductively Coupled Plasmas T. Nakano, National Defense Academy, Japan, S. Samukawa, Tohoku University, Japan |
| 11:40am | PS+MS-TuM11 Dependence of Radical Densities on Fluorocarbon Feed Gases in a Dielectric Etch Plasma E.A. Hudson, J. Luque, Lam Research Corp., N. Bulcourt, J.P. Booth, Ecole Polytechnique, France |