AVS 49th International Symposium
    Thin Films Tuesday Sessions
       Session TF-TuP

Paper TF-TuP22
Solutions for the Deposition of Complex Optical Filters with Dual Ion Beam Sputtering

Tuesday, November 5, 2002, 5:30 pm, Room Exhibit Hall B2

Session: Poster Session
Presenter: R. Blacker, Veeco Instruments Inc.
Authors: R. Blacker, Veeco Instruments Inc.
D. Deakins, Veeco Instruments Inc.
A. Dummer, Veeco Instruments Inc.
J. George, Veeco Instruments Inc.
Y. Godwal, Colorado State University
I. Kameyama, Veeco Instruments Inc.
S.M. Lee, Veeco Instruments Inc.
N. Van Lieu, Veeco Instruments Inc.
C.S. Menoni, Colorado State University
D. Siegfried, Veeco Instruments Inc.
G. Vaschenko, Colorado State University
C. Montcalm, Veeco Instruments Inc.
Correspondent: Click to Email
Demand for complex optical filters with increasingly tighter tolerance specifications is expanding. The need for more complex strategies to meet filter performances is also becoming increasingly apparent. The requirements for ultra low loss filters, low reflectivity filters (<-40 dB), highly specified broadband filters (gain flattening, beam splitter) and tight narrow band filters (50 GHz and 25 GHz dense wavelength division multiplex) are becoming more stringent, hence the need for ever more complex strategies to meet these demands.This paper presents examples of such complex filters in the context of their usage and required specifications, illustrating the degree of accuracy required during deposition to allow such filters to be realized. We present techniques using ion beam deposition that allows the layer thickness accuracies to be increased over currently obtainable levels. Optical monitoring strategies, substrate temperature control, robust filter design and ion source improvements are illustrated as specific examples. The suitability of current technology for anticipated future needs is explored, and areas of potential improvement are identified.