AVS 49th International Symposium
    Processing at the Nanoscale Thursday Sessions
       Session PN+SS-ThM

Paper PN+SS-ThM6
High Resolution Chemo-Mechanical Functionalization of Silicon Surfaces by Atomic Force Microscope

Thursday, November 7, 2002, 10:00 am, Room C-109

Session: Patterning and Functionalization
Presenter: R.C. Davis, Brigham Young University
Authors: R.C. Davis, Brigham Young University
B.A. Wacaser, Brigham Young University
T.L. Niederhauser, Brigham Young University
I.A. Mowat, Charles Evans & Associates
M.R. Linford, Brigham Young University
Correspondent: Click to Email
We describe a versatile high-resolution method for chemical functionalization of silicon surfaces. An atomic force microscope (AFM) probe is used to mechanically induce chemical functionalization thereby simultaneously patterning and functionalizing the hydrogen-terminated silicon. A 20 nm radius of curvature probe is used to scribe the hydrogen-terminated silicon. When the Si-H and Si-Si bonds are broken in the presence of unsaturated hydrocarbons a reaction occurs in which the hydrocarbon chain is covalently bonded to the Si surface. Using this technique we have produced patches and patterned lines of alkene molecules on a Si (111) substrate with line widths down to 100 nm. Time of flight secondary ion mass spectroscopy measurements verifying the high-resolution chemical functionalization will be presented.