AVS 49th International Symposium
    Processing at the Nanoscale Thursday Sessions
       Session PN+SS-ThM

Paper PN+SS-ThM10
Ferroelectric Lithography for Multicomponent Nanofabrication

Thursday, November 7, 2002, 11:20 am, Room C-109

Session: Patterning and Functionalization
Presenter: D.A. Bonnell, University of Pennsylvania
Authors: D.A. Bonnell, University of Pennsylvania
S.V. Kalinin, University of Pennsylvania
R.A. Alvarez, University of Pennsylvania
X. Lei, University of Pennsylvania
R. Shao, University of Pennsylvania
Z. Hu, University of Pennsylvania
J.H. Ferris, University of Pennsylvania
Correspondent: Click to Email
In spite of the variety of approaches to the assembly of nanowires, nanoparticles, and organic/biological molecules, device functionality has been achieved in only a few select systems. The organization of dissimilar molecular or nanostructural constituents into predefined structures necessary to yield functionality remains a challenge. We report here a novel approach that controls atomic polarization of ferroelectric substrates to vary local electronic structure. It will be demonstrated that chemical reactivity involving electron transfer is domain specific due to surface band bending. The minimum feature size is on the order of 3 nm and resolution positioning 10-20 nm. When combined with chemistry associated with self assembly, nanostructure composites consisting of oxide substrates, metal nanoparticles, and organic/biological molecules can be fabricated in predefined configurations. This leads to the potential to make electronic or opto-electronic devices on the 10 nm size scale. The approach will be demonstrated with simple devices.