AVS 49th International Symposium
    Applied Surface Science Tuesday Sessions
       Session AS-TuP

Paper AS-TuP22
Basic Characterization of Arcing in Sputtering Targets

Tuesday, November 5, 2002, 5:30 pm, Room Exhibit Hall B2

Session: Topics in Applied Surface Science
Presenter: F.G. Tomasel, Advanced Energy, Inc.
Authors: F.G. Tomasel, Advanced Energy, Inc.
D. Carter, Advanced Energy, Inc.
H. Walde, Advanced Energy, Inc.
J.J. Gonzalez, Advanced Energy, Inc.
G.A. Roche, Advanced Energy, Inc.
Correspondent: Click to Email
Arcing in sputtering deposition is a very well known phenomenon that affects quality of thin films. Different strategies have been devised to reduce arcing during the deposition process. However, it is felt that there is still a need for a further description of the basics of arc formation. This article intends to contribute in this subject by presenting a detailed description of the formation and evolution of arcs. The study combines the spatial and time resolved results of ultra high-speed, single frame photographs with an electrical characterization of the current and voltage waveforms for arcs occurring on different sputtering targets. Elaborating on these data, we will present a possible explanation for the results observed.