AVS 49th International Symposium
    Applied Surface Science Tuesday Sessions
       Session AS-TuP

Paper AS-TuP2
Development of a Large Area XPS Imaging Instrument

Tuesday, November 5, 2002, 5:30 pm, Room Exhibit Hall B2

Session: Topics in Applied Surface Science
Presenter: Y. Iijima, JEOL Ltd., Japan
Authors: T. Tazawa, JEOL Ltd., Japan
M. Kato, JEOL Ltd., Japan
M. Kudo, JEOL Ltd., Japan
Y. Iijima, JEOL Ltd., Japan
K. Tsutsumi, JEOL Ltd., Japan
Correspondent: Click to Email
Recently, the photoelectron image measurement by XPS has become a very general surface analysis method. However, the measurement over the whole sample surface is very difficult because the measurable image region by the micro analysis in XPS is small. We developed an XPS instrument which is able to measure the region covering from 30x30µm@super 2@ to 50x18mm@super 2@. The photoelectron image measuring method is the stage scanning method. The minimum image resolution of this instrument is 30µmm or less. For this instrument, a newly designed magnetic lens was developed to achieve a better performance than the static lens system. This magnetic lens to measure a micro area is placed under the sample stage. In addition, the X and Y axes of sample stage can be operated by an accuracy of 1µm. The maximum operation ranges of the X and Y axes are 0-50mm and 0-18mm, and they are controlled by a PC system. We obtained photoelectron images of a polymer surface and a hard disk surface with this XPS instrument, polymer surface and hard disk surface. The results show that the large area XPS imaging analysis is very effective in the measurement of element distribution and chemical states of the sample surface by surface analysis. So we can say this instrument as "Chemical state image XPS". Moreover, the total reflection XPS (TRXPS) measurement function was added to this XPS instrument. TRXPS is a new surface analysis method, has sensitivity several times higher than XPS in surface analysis of the semiconductor such as Si wafers.