AVS 49th International Symposium
    Applied Surface Science Tuesday Sessions
       Session AS-TuA

Paper AS-TuA8
Nano-XAS and Nano-XPS: Energy-discriminating Imaging Utilizing a PEEM Lens Combined with Retarding or Dispersive Electron Energy Filters

Tuesday, November 5, 2002, 4:20 pm, Room C-106

Session: Imaging in Surface Analysis
Presenter: M. Merkel, FOCUS GmbH, Germany
Authors: M. Merkel, FOCUS GmbH, Germany
M. Escher, FOCUS GmbH, Germany
J. Settemeyer, FOCUS GmbH, Germany
M. Schicketanz, FOCUS GmbH, Germany
T. Unger, FOCUS GmbH, Germany
D. Funnemann, OMICRON GmbH, Germany
J. Westermann, OMICRON GmbH, Germany
B. Krömker, OMICRON GmbH, Germany
Ch. Ziethen, Johannes Gutenberg Universität, Germany
A. Oelsner, Johannes Gutenberg Universität, Germany
P. Bernhard, Johannes Gutenberg Universität, Germany
F. Wegelin, Johannes Gutenberg Universität, Germany
A. Krasyuk, Johannes Gutenberg Universität, Germany
G. Schönhense, Johannes Gutenberg Universität, Germany
Correspondent: Click to Email
The strong gradient in the field of nanotechnology and materials research calls for surface imaging techniques with nanoscopic lateral resolution and intrinsic spectroscopic information. We will present our recent activities in this field. We have already reported on the combination of a laboratory X-ray source with an energy filtered bolt-on photoemission electron microscope (PEEM) optics.@footnote 1@ Spectroscopic information with sub-micron lateral resolution was possible, however imaging at certain spectroscopic features failed due to the lack of excitation intensity. Recently, this development received strong impetus from novel technical achievements. For example, micro technology delivers new solutions in terms of electron optical components with critical dimensions. Highly brilliant synchrotron beamlines deliver the needed excitation intensity. Finally, state of the art ray tracing and a three dimensional computer aided design is capable of delivering optimised technical solutions. Two approaches with their actual results will be shown in comparison: PEEM imaging combined both with an energy dispersive analyser and with the most advanced RFA type imaging energy filter. The latest milestone results of dedicated research projects will be reported, showing the present limits of Nano-XAS (X-ray absorption spectroscopy) and Nano-XPS (X-ray photoelectron spectroscopy). Until now, we achieved about 20nm lateral resolution using the XAS imaging mode. Using XPS we got about 140 nm resolution. These methods also provide well differentiated spectra drawn from sample areas near the resolution limit. The best energy resolution of both methods is currently about 0.1 eV. Part of the work was funded by BMBF, Germany, through grants FKZ-No: 13N7864, 13N7887 and 13N7863. @FootnoteText@ @footnote 1@ M.Merkel, M. Escher, J. Settemeyer, D. Funnemann, A. Oelsner, Ch. Ziethen, O. Schmidt, M. Klais und G. Schönhense, Surface Science 480 (2001), 196-202.